Polishing Slurry Supplier & Manufacturer โ€” Since 2002

Factory-direct diamond slurries, CMP slurry and oxide polishing suspensions for wafer, optical and precision manufacturing. ISO9001, 49+ patents, custom formulations. Free samples for qualified B2B buyers.

Since 2002  |  12,000 mยฒ Factory  |  49+ Patents  |  ISO9001 Certified

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Trusted by industrial manufacturers worldwide

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Polishing Slurry & Suspension Range

Monocrystalline Diamond Slurry

Monocrystalline Diamond Slurry

High cut-rate diamond slurry for hard materials: sapphire, ceramics, carbide.
Polycrystalline Diamond slurry 2

Polycrystalline Diamond Slurry

Self-sharpening polycrystalline structure for superior surface finish on demanding substrates.
Nano Diamond Slurry

Nano Diamond Slurry

Nano-grade dispersion for final polish and haze removal on optics and connectors.
SC AO CO Polishing Slurry (1)

CMP & Oxide Slurries

Silicon carbide, aluminum oxide and cerium oxide slurries for CMP and glass polishing.

Diamond ยท SiC ยท AO ยท CeOโ‚‚ slurries ยท water/oil based ยท ready-to-use or concentrate ยท custom formulations

Slurry Product Line โ€” Full Specifications

Monocrystalline Diamond Slurry

Monocrystalline Diamond Slurry

Monocrystalline diamond slurry for lapping and polishing hard materials โ€” sapphire, technical ceramics, tungsten carbide and hardened steels. Blocky crystal shape delivers high, predictable cut rates while dispersion control keeps scratch depth uniform across the batch.

Grades (ยตm)6, 4, 3, 2, 1, 1/2, 1/4, 1/6, 1/10 ยตm โ€” MD-6 to MD-N100
Model suffix-W water-based / -O oil-based (e.g. MD-3-W, MD-3-O)
Rough-surface line (RCD)17, 10, 6, 5, 4, 3 ยตm โ€” RC-17 to RC-3, for high removal rate lapping
AbrasiveMonocrystalline diamond
CarrierWater-based or oil-based
SupplyReady-to-use or concentrate
PackagingBottles to bulk
Typical applicationsSapphire, ceramics, carbide, metallography

Polycrystalline Diamond Slurry

Polycrystalline diamond slurry whose multi-faceted crystals self-sharpen during polish โ€” finer finishes at equivalent removal rates, preferred for wafer back-side polish, optics and finish-critical metallographic preparation.

Grades (ยตm)6, 4, 3, 2, 1, 1/2, 1/4, 1/5, 1/10, 1/20 ยตm โ€” PC-6 to PC-N50
Model suffix-W water-based / -O oil-based (e.g. PC-3-W, PC-3-O)
Abrasive sourcePCD powder produced in-house, synthesized by explosive method
AbrasivePolycrystalline diamond
CarrierWater-based or oil-based
SupplyReady-to-use or concentrate
PackagingBottles to bulk
Typical applicationsWafer polish, optics, metallography
Polycrystalline Diamond slurry 2
Nano Diamond Slurry

Nano Diamond Slurry & Suspensions

Nano diamond slurry and diamond suspension for the final, haze-removing polish step on fiber optic connector endfaces, precision optics and semiconductor components. Agglomeration-controlled dispersion protects the surface you just spent hours building.

Grades (ยตm)1/4, 1/5, 1/6, 1/10, 1/20, 1/30 ยตm โ€” DND-250 to DND-30
Model suffix-W water-based / -O oil-based (e.g. DND-100-W, DND-100-O)
Surface finishDesigned to achieve workpiece surface roughness of 0.2 nm or less
AbrasiveNano diamond
DispersionAgglomeration-controlled, water-based
SupplyReady-to-use or concentrate
PackagingBottles, bulk
Typical applicationsFinal polish: optics, connectors, semiconductors

CMP Slurry & Oxide Polishing Suspensions

CMP slurry plus silicon carbide, aluminum oxide and cerium oxide polishing suspensions for chemical-mechanical planarization, optical glass and display panel finishing. Formulations tuned in-house โ€” tell us your substrate, pad and target removal rate.

ModelsSOQ-12D ยท SO-100-PF ยท SO-80-PF ยท SO-60-PF ยท SO-40-PF ยท SO-20-PF
Particle size10โ€“30 / 30โ€“50 / 50โ€“70 / 70โ€“90 / 90โ€“110 nm, spherical colloidal silica
pH10.5 ยฑ 0.5
Viscosity<10 cst (SO-20-PF <30 cst)
Concentration20โ€“50% (SO-20-PF 10โ€“40%)
Package5 kg / 20 kg
TypesCMP slurry, SiC / AO / CeOโ‚‚ suspensions
CarrierWater-based
CustomizationParticle size, concentration, formulation
PackagingBottles to bulk
Typical applicationsCMP, optical glass, LCD panel, wafers
CMP Slurry 3

All slurries formulated and batch-tested in-house. Custom particle size, concentration and carrier formulations developed against your process window.

A Real Factory, Not a Trading Company

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GRISH has manufactured precision abrasives since 2002 in a 12,000 mยฒ factory & laboratory with imported coating and converting equipment. Over 20 years of joint R&D with universities turned research projects into 49 invention patents โ€” and GRISH co-authored 5 industry standards for polishing materials. Slurries are formulated, blended and batch-tested in-house, so dispersion stability and lead time stay under our control, not a middleman’s.

ISO9001 2024.05.14 2027.06.13 1 scaled
ISO14001 2024.05.14 2027.06.13 1 scaled
ISO45001 2024.05.14 2027.06.13 1 scaled

Certified: ISO 9001 quality ยท ISO 14001 environmental ยท ISO 45001 occupational safety

What buyers compareGRISH (factory-direct)Typical trading company
Custom formulations, particle sizes & concentrationsMade on our own lines to your specLimited to whatever stock exists
Batch consistency & traceabilityIn-house blending, QC records per batchVaries by whichever factory supplied
Technical supportR&D engineers who formulate the abrasivesSales reps relaying questions
Lead time controlProduction schedule under our controlDependent on upstream factories
Price structureFactory price, no middle layerFactory price + trader margin

From Specs to Samples in 3 Steps

1. Send Your Specs

Application, abrasive type, particle size, carrier and estimated volume โ€” or just describe your process if unsure.

2. Engineer Review & Quote

Our application engineers confirm the right formulation and send a factory-direct quotation within 24 hours.

3. Free Sample & Trial Order

Qualified B2B buyers receive free samples. Validate on your line before committing to volume.

Built for Your Application

1 0000 Semiconductor Materials

Semiconductor & Wafer

CMP and back-side polish with batch-consistent slurry behavior.
1 0002 Optical Glass

Optical Glass & Lenses

Cerium oxide and diamond sequences for scratch-free optical surfaces.
1 0005 metallography banner 1

Metallography Labs

Repeatable sample prep with mono and poly diamond suspensions.

Fiber Optic LED & Semiconductor Optical Glass LCD Panel Automobile Industrial Roller Metal Parts Ceramics & Precious Materials Metallography Micro Motor 3C Electronics Dental

Why Global Buyers Choose GRISH

3,000+

Value customers served worldwide

9,000+

Industry polishing solutions delivered

49

Invention patents ยท co-author of 5 industry standards

200+

Employees incl. 100+ production technicians

Frequently Asked Questions

Yes. Custom grades, formats and packaging are available. OEM/ODM orders are welcome.

Trial orders are welcome, and free samples are available for qualified B2B buyers โ€” just tell us your application when you send the RFQ.

Common B2B terms are supported โ€” T/T and other standard arrangements, with EXW / FOB / CIF trade terms quoted per your destination.

Standard products ship quickly from factory stock; custom specifications are quoted with a clear production lead time before you commit.

Yes. Our in-house R&D formulates against your substrate, pad and removal-rate targets โ€” this is a core service behind our 49 patents. Share your process window in the RFQ.

Comparing Polishing Slurry Suppliers?

Send your substrate and process targets once โ€” get a factory-direct quote with free samples.

GRISH ยท Precision abrasives factory since 2002 ยท grish@grish.com ยท WhatsApp +86 159 7147 0533